Portfolio | Hi-Tech/Corporate

NanoFab Phase II, CESTM, CNSE - Structural Foundation

U.W. Marx installed the foundational structure for the 225,000 sf facility, which includes a 35,000 SF cleanroom for fabrication of 300mm semiconductor wafers.

The project required a super flat floor for the various machinery to be installed in the facility, requiring more than 7,300 yards of concrete in the floor alone.

An additional 5,000 yards of concrete was required for the vertical work which consisted of walls and columns. The U.W. Marx team also installed more than 1,000 tons of reinforcing steel.